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| 001 | ocn841199237 | ||
| 003 | OCoLC | ||
| 005 | 20171224114301.0 | ||
| 006 | m o d | ||
| 007 | cr ||||||||||| | ||
| 008 | 130423s2013 mau ob 001 0 eng | ||
| 010 | _a 2013016681 | ||
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_a961668112 _a962576539 |
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_z9781118062777 _q(cloth ; _qalk. paper) |
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| 020 |
_z1118062779 _q(cloth ; _qalk. paper) |
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_a(OCoLC)841199237 _z(OCoLC)961668112 _z(OCoLC)962576539 |
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| 042 | _apcc | ||
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| 082 | 0 | 0 |
_a620/.5 _223 |
| 049 | _aMAIN | ||
| 100 | 1 | _aKääriäinen, Tommi. | |
| 245 | 1 | 0 |
_aAtomic layer deposition : _bprinciples, characteristics, and nanotechnology applications / _cTommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. |
| 250 | _a2nd edition. | ||
| 264 | 1 |
_aSalem, Massachusetts : _bScrivener Publishing, LLC ; _aHoboken, New Jersey : _bWiley, _c[2013] |
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| 300 | _a1 online resource. | ||
| 336 |
_atext _btxt _2rdacontent |
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| 337 |
_acomputer _bc _2rdamedia |
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| 338 |
_aonline resource _bcr _2rdacarrier |
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| 504 | _aIncludes bibliographical references and index. | ||
| 588 | 0 | _aPrint version record and CIP data provided by publisher. | |
| 650 | 0 | _aChemical vapor deposition. | |
| 650 | 0 | _aEpitaxy. | |
| 650 | 0 | _aMicroelectronics. | |
| 650 | 0 | _aNanotechnology. | |
| 650 | 7 |
_aSCIENCE _xNanoscience. _2bisacsh |
|
| 650 | 7 |
_aTECHNOLOGY & ENGINEERING _xNanotechnology & MEMS. _2bisacsh |
|
| 650 | 7 |
_aChemical vapor deposition. _2fast _0(OCoLC)fst00853229 |
|
| 650 | 7 |
_aEpitaxy. _2fast _0(OCoLC)fst00914372 |
|
| 650 | 7 |
_aMicroelectronics. _2fast _0(OCoLC)fst01019757 |
|
| 650 | 7 |
_aNanotechnology. _2fast _0(OCoLC)fst01032639 |
|
| 650 | 7 |
_aNanotechnologie _2gnd _0(DE-588)4327470-5 |
|
| 650 | 7 |
_aAtomlagenabscheidung _2gnd _0(DE-588)7712127-2 |
|
| 650 | 7 |
_aMikroelektromekaniska system. _2sao |
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| 655 | 4 | _aElectronic books. | |
| 655 | 7 |
_aElectronic books. _2local |
|
| 700 | 1 |
_aCameron, David, _d1949- |
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| 700 | 1 | _aKääriäinen, Marja-Leena. | |
| 700 | 1 |
_aSherman, Arthur, _d1931- |
|
| 776 | 0 | 8 |
_iPrint version: _aKääriäinen, Tommi. _tAtomic layer deposition. _dHoboken, New Jersey : John Wiley & Sons, [2013] _z9781118062777 _w(DLC) 2013016209 |
| 856 | 4 | 0 |
_uhttp://onlinelibrary.wiley.com/book/10.1002/9781118747407 _zWiley Online Library |
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